Good news for my last employer
Intel commits to EUV lithography
The machine shown in the article is the one I worked with at Sandia. I was responsible for the 1.5kW laser that we focused into a jet of liquid xenon inside the machine. This resulted in a 300,000 degree plasma that emitted some 13 nm light. we collected the light and used it to make features on wafers. theoretically the technology would allow you to make the smallest features that silicon will allow!!