publications
check out:
http://www.llnl.gov/nif/dir_library.html
I do not have access to journals from home... so I cant point you to articles of a more technical nature...
as for why we were trying to make 13.6 nm light:
http://whatis.techtarget.com/definition/0,,sid9_gci213952,00.html
http://www.sandia.gov/bus-ops/partnerships/tech-access/facilities/euvl.html
Extreme ultraviolet lithography will make the smallest features on silicon that are possible- it was the funnest project I have ever worked on...