I was focussing 1,500 watts of 1.064 micron laser light into liquid/solid xenon... The plasma created had a temp of 300,000 degerees Kelvin...this works out to about an energy of 25 eV.... but due to coulomb explosion many ions had energies in the hundreds of eV...

(This was done for the EUVL project at Sandia... as the plasma recombined it emitted light at 13.6 nm which we were using to do lithography on Silicon... if the process becomes feasable it will take chip feature sizes to the limit of what you can do with silicon...)

The chip making companies have already commited to 13nm lithography... so expect to hear more about it in the next few years....